| 專利名稱(英) | INSPECTION METHOD FOR MULTILAYER SEMICONDUCTOR DEVICE |
| 專利家族 |
中華民國:I777576 美國:11,313,670 |
| 專利權人 | 國立清華大學 100.00% |
| 發明人 | 衛子健,徐米克,黎德英 |
| 技術領域 | 光電光學 |
| An inspection method for a multilayer semiconductor device is provided. The inspection method can investigate multilayered ensembles of a multilayer semiconductor device and obtain stratigraphic thickness (ST) maps of each layer in the multilayer semiconductor device by utilizing absorption edges of materials of interests and obtaining calibration quality curves. |
| 承辦人姓名 | 李馥如 |
| 承辦人電話 | 03-5715131 #34576 |
| 承辦人Email | fujulee@mx.nthu.edu.tw |