A vapor chamber device includes a first shell, a second shell and a second capillary structure. The first shell includes a first capillary structure located on an inner surface of a first plate. The inner surface includes a first area and a second area, and the first capillary structure includes first trenches formed between first ridges and second trenches formed between second ridges. The first ridges and the first trenches are located in the first region, and the second ridges and the second trenches are located in the second region. A width of each of the second trenches is less than a width of each of the first trenches. The second shell is stacked on the first shell and includes supporting posts protruding from a second plate. The second capillary structure is disposed between the first capillary structure and the support posts of the second shell. |