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專利授權區
專利名稱(中)	具有極低折射率的抗反射構造及含有此構造的裝置
專利名稱(英)	Antireflection structures with an exceptional low refractive index and devices containing the same
專利家族	中華民國：I425058 美國：8,518,561
專利權人	國立清華大學 100%
發明人	果尚志,陳虹穎,佘銘軒,薛涵宇,何榮銘
技術領域	材料化工,光電光學

專利摘要(中)
Nanoporous polymers with gyroid nanochannels can be fabricated from the self-assembly of degradable block copolymer, polystyrene-b-poly(L-lactide) (PS-PLLA), followed by the hydrolysis of PLLA blocks. A well-defined nanohybrid material with SiO.sub.2 gyroid nanostructure in a PS matrix can be obtained using the nanoporous PS as a template for the sol-gel reaction. After subsequent UV degradation of the PS matrix, a highly porous inorganic gyroid network remains, yielding a single-component material with an exceptionally low refractive index (as low as 1.1).

專利摘要(中)

Nanoporous polymers with gyroid nanochannels can be fabricated from the self-assembly of degradable block copolymer, polystyrene-b-poly(L-lactide) (PS-PLLA), followed by the hydrolysis of PLLA blocks. A well-defined nanohybrid material with SiO.sub.2 gyroid nanostructure in a PS matrix can be obtained using the nanoporous PS as a template for the sol-gel reaction. After subsequent UV degradation of the PS matrix, a highly porous inorganic gyroid network remains, yielding a single-component material with an exceptionally low refractive index (as low as 1.1).

聯絡資訊
承辦人姓名	周家鳳
承辦人電話	03-5715131 #34576
承辦人Email	cf.chou@mx.nthu.edu.tw