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專利授權區
專利名稱(中) 適用於大面積曝光之拼接式雷射干涉微影設備
專利名稱(英) LASER INTERFERENCE LITHOGRAPHY APPARATUS CAPABLE OF STITCHING SMALL EXPOSED AREAS INTO LARGE EXPOSED AREA
專利家族 中華民國:I401541
美國:US 8,400,616 B2
專利權人 國立清華大學 100%
發明人 傅建中
技術領域 光電光學
專利摘要(中)
A laser interference lithography apparatus capable of stitching small exposed areas into a large exposed area includes a body, a laser beam supplying unit, a reflecting mechanism, an L-shaped fixing mechanism and a substrate stage. The laser beam supplying unit fixed onto the body provides a laser beam. The reflecting mechanism is movably and rotatably mounted on the body. The L-shaped fixing mechanism mounted on the body includes a first mounting seat and a second mounting seat. An upright first reflecting mirror is fixed to the first mounting seat. The second mounting seat connected to the first mounting seat fixes a horizontal mask, and is substantially perpendicular to the first mounting seat. The substrate stage, movably mounted on the body and disposed below the second mounting seat, supports a substrate. Thus, a large-area pattern formed by stitching small-area patterns may be obtained.
聯絡資訊
承辦人姓名 劉千綺
承辦人電話 03-571-5131 #31181
承辦人Email chienchi@mx.nthu.edu.tw
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