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專利授權區

專利授權區
專利名稱(中)	輻射冷却裝置及其製備方法和應用
專利名稱(英)	Radiation cooling device and its preparation method and application
專利家族	PCT：WO2023159413A1(公開號) 中華民國：I808520 美國：US20230137727A1(公開號)
專利權人	國立清華大學 100.00%
發明人	萬德輝,蔡孟廷,陳彥任,張思偉,陳學禮
技術領域	材料化工,能源科技,光電光學

專利摘要(中)
一種輻射冷却裝置，包括一輻射冷却層，該輻射冷却層係由具有高能隙的複數個極化材料所組成，該極化材料具有至少一光散射單元以及一熱放射單元，其中該光散射單元可以與一太陽輻射相互作用產生散射，該熱放射單元可以與一熱輻射交互作用並增益該熱輻射能量強度。

專利摘要(英)
A radiation cooling device includes a radiation cooling layer composed of a plurality of polarized materials with a high energy gap, the polarized material having at least one light scattering unit and a heat radiation unit, wherein the light scattering unit can interact with a solar radiation to generate scattering, and the heat radiation unit can interact with a thermal radiation and increase the energy intensity of the thermal radiation.

專利摘要(英)

A radiation cooling device includes a radiation cooling layer composed of a plurality of polarized materials with a high energy gap, the polarized material having at least one light scattering unit and a heat radiation unit, wherein the light scattering unit can interact with a solar radiation to generate scattering, and the heat radiation unit can interact with a thermal radiation and increase the energy intensity of the thermal radiation.

聯絡資訊
承辦人姓名	劉千綺
承辦人電話	03-571-5131 #31181
承辦人Email	chienchi@mx.nthu.edu.tw