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專利授權區
專利名稱(中)	奈米多孔性高分子薄膜製備方法及奈米多孔性薄膜製備方法
專利名稱(英)	METHOD FOR FABRICATING NANOPOROUS POLYMER THIN FILM AND METHOD FOR FABRICATING NANOPOROUS THIN FILM
專利家族	中華民國：I663198 美國：11,059,205
專利權人	國立清華大學 100.00%
發明人	簡佑丞,孟哈,希蘇翰,何榮銘
技術領域	材料化工

專利摘要(中)
A method for fabricating nanoporous polymer thin film includes steps as follows. A polymer thin film is provided, wherein a polymer solution including a polymer is coated on a substrate to form the polymer thin film. A swelling and annealing process is provided, wherein the polymer thin film is disposed inside a chamber with a vapor of a first solvent, the polymer thin film is swollen and annealed to form a swollen polymer thin film, and the swollen polymer thin film includes the polymer and the first solvent. A freezing process is provided, wherein the swollen polymer thin film is cooled to a temperature less than or equal to a crystallization temperature of the first solvent to crystallize the first solvent. A first solvent removing process is provided, wherein the first solvent is removed with a second solvent, such that a nanoporous polymer thin film is obtained.

專利摘要(中)

A method for fabricating nanoporous polymer thin film includes steps as follows. A polymer thin film is provided, wherein a polymer solution including a polymer is coated on a substrate to form the polymer thin film. A swelling and annealing process is provided, wherein the polymer thin film is disposed inside a chamber with a vapor of a first solvent, the polymer thin film is swollen and annealed to form a swollen polymer thin film, and the swollen polymer thin film includes the polymer and the first solvent. A freezing process is provided, wherein the swollen polymer thin film is cooled to a temperature less than or equal to a crystallization temperature of the first solvent to crystallize the first solvent. A first solvent removing process is provided, wherein the first solvent is removed with a second solvent, such that a nanoporous polymer thin film is obtained.

聯絡資訊
承辦人姓名	李馥如