一種蕭特基二極體元件,包括:一基板、一緩衝層形成於該基板上、一上層形成於該緩衝層上、一第一電極層形成於該上層上作為該蕭特基二極體元件之陽極、一第二電極層設於該上層上作為該蕭特基二極體元件之陰極、一第一n型參雜區形成於該第一電極層之邊緣內側下方的該上層中,且與該第一電極層接觸;其中,該第一n型參雜區的邊緣與該第一電極層的邊緣,於該第一電極層面向該第二電極層的一第一方向上,係相隔一第一既定距離。 A schottky barrier dioide component comprises a substrate, a buffer layer formed on the substrate, a upper layer formed on the buffer layer, a first electrode layer formed on the upper layer as the anode of the schottky barrier dioide component, a second electrode layer formed on the upper layer as the cathode of the schottky barrier dioide component, a first n-type doping region formed in the upper layer beneath the first electrode layer, formed at the inner side of the edge of the first electrode layer and contacting the first electrode layer, wherein the edge of the first electrode layer and the edge of the first electrode layer form a first predetermined distance toward a first direction at which the first electrode layer faces the second electrode layer. |