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專利授權區
專利名稱(中) 異質結構光電催化劑及其製造方法
專利名稱(英) HETEROSTRUCTURED PHOTOELECTROCATALYST AND METHOD OF FABRICATING THE SAME
專利家族 中華民國:202435965(公開號)
大陸:CN118634840A(公開號)
美國:US20240301574A1(公開號)
專利權人 國立清華大學 100%
發明人 嚴大任,陳君彥,毛敬涵
技術領域 能源科技,光電光學
專利摘要(英)
A heterostructured photoelectrocatalyst and a method of fabricating the same. The heterostructured photoelectrocatalyst according to the invention includes a substrate, a plurality of nano-wires, a plurality of metal nano-particles and a transition metal compound film. The substrate is formed of a semiconductor material with a first conductive type. The plurality of nano-wires are formed of the semiconductor material and formed on an upper surface of the substrate. Each nano-wire thereon exists a few of the plurality of metal nano-particles. The compound film is formed to overlay the plurality of nano-wires and the plurality of metal nano-particles. The transition metal compound film can formed of a transition metal sulfide, a transition metal telluride or a transition metal selenide. The compound film has a second conductive type different from the first conductive type.
聯絡資訊
承辦人姓名 楊美茹
承辦人電話 03-5715131 #62305
承辦人Email mjyang2@mx.nthu.edu.tw
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