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專利授權區

專利授權區
專利名稱(中)	用於電子顯微鏡的測試樣品及其製作方法
專利名稱(英)	Test specimen for electron microscope and manufacturing method thereof
專利家族	中華民國：I752679 大陸：CN114441561B 美國：US11227742B1
專利權人	國立清華大學 100%
發明人	陳健群,彭裕庭
技術領域	材料化工,機械結構,光電光學,電子電機

專利摘要(英)
A test specimen for an electron microscope includes a carrier board, a test object and a protective layer. The test object is setup on the carrier board. The protective layer which is composed of amorphous aluminum oxide covers on the test object, and its thickness is not more than 5nm. The protective layer which covering on the test object can prevent the test object from being damaged by the electron beam during a detection of the electron microscope, and it also reduces the occurrence of carbon deposition effect. When the electron beam is transmitted through the protective layer, there is no lattice diffraction to affect an analysis and an imaging of the test object. Besides, this invention also provides a manufacturing method for the test specimen.

專利摘要(英)

A test specimen for an electron microscope includes a carrier board, a test object and a protective layer. The test object is setup on the carrier board. The protective layer which is composed of amorphous aluminum oxide covers on the test object, and its thickness is not more than 5nm. The protective layer which covering on the test object can prevent the test object from being damaged by the electron beam during a detection of the electron microscope, and it also reduces the occurrence of carbon deposition effect. When the electron beam is transmitted through the protective layer, there is no lattice diffraction to affect an analysis and an imaging of the test object. Besides, this invention also provides a manufacturing method for the test specimen.

聯絡資訊
承辦人姓名	楊美茹
承辦人電話	03-5715131 #62305
承辦人Email	mjyang2@mx.nthu.edu.tw