The present disclosure provides a high efficiency embedded-artificial synaptic element, which includes a semiconductor substrate, a select transistor, a metal layer, a first memory transistor and a second memory transistor. The select transistor is disposed on the semiconductor substrate and includes a select gate structure, a drain region and a source region. The metal layer is connected to the drain region. The first memory transistor includes a first gate structure, a first electrode regions and a first memristor. The second memory transistor includes a second gate structure, a second electrode regions and a second memristor. The second electrode regions and the first electrode regions are connected to each other and form a connection region. The connection region is connected to the metal layer. The first memristor is formed between the first gate structure and the connection region, and the second memristor is formed between the second gate structure and the connection region. Therefore, the output voltage has a good read window. |