專利授權區國立清華大學國際產學營運總中心 Operations Center for Industry Collaboration

搜尋專利授權區

關鍵字

» 新增關鍵字

選單

專利授權區

專利授權區
專利名稱(中)	微影裝置、微粒檢測方法以及半導體製程
專利名稱(英)	PHOTOLITHOGRAPH APPARATUS, METHOD FOR INSPECTING PARTICLES AND SEMICONDUCTOR PROCESS
專利家族	中華民國：202503417(公開號) 美國：2025-0020570(公開號)
專利權人	國立清華大學 100.00%
發明人	林本堅,高蔡勝,陳柏熊,呂柏勳,羅孟承
技術領域	光電光學,電子電機

專利摘要(中)
一種微粒檢測方法，適於檢測基材上的微粒。此微粒檢測方法包括：將基材置於載台上；提供檢測輻射以照射於基材上，其中檢測輻射適於激發基材上之微粒以發出二次輻射；以及偵測二次輻射以確認基材上是否存在有微粒並偵測微粒之位置。

專利摘要(英)
A particle inspection method for inspecting particles on a substrate is provided. The particle inspection method includes: disposing the substrate on a carrying stage; providing an inspection radiation to irradiate on the substrate, wherein the inspection radiation is suitable for exciting the particles on the substrate to irradiate a secondary radiation; and ensuring whether particles exist and finding the locations of particles if the particles exist on the substrate by detecting the secondary radiation.

專利摘要(英)

A particle inspection method for inspecting particles on a substrate is provided. The particle inspection method includes: disposing the substrate on a carrying stage; providing an inspection radiation to irradiate on the substrate, wherein the inspection radiation is suitable for exciting the particles on the substrate to irradiate a secondary radiation; and ensuring whether particles exist and finding the locations of particles if the particles exist on the substrate by detecting the secondary radiation.

聯絡資訊
承辦人姓名	李曉琪
承辦人電話	03-5715131 #31061
承辦人Email	hsiaochi@mx.nthu.edu.tw