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專利授權區

專利授權區
專利名稱(中)	製備官能基化環化合物的方法和反應混合物
專利名稱(英)	METHOD AND MIXTURE TO FORM FUNCTIONALIZED CYCLIC COMPOUNDS
專利家族	中華民國：I739085 美國：11,053,189
專利權人	國立清華大學 100%
發明人	舒曼,韓建中
技術領域	材料化工,生化醫藥

專利摘要(中)
A method for producing a homocyclic or heterocyclic compound includes reacting a compound of formula (I) with a compound of formula (II) in presence of a base: R1-B-G (I) . In formula (I), B is an unsaturated moiety selected from substituted or unsubstituted vinylene, ethynylene, aryleneethynylene, substituted or unsubstituted arylenevinylene, and a combination thereof, the vinylene or arylenevinylene has n (=0, 1 or 2) substituent(s) R2, G is an electron-withdrawing group, R1 is hydrogen or a substituent, and two of R1, R2 and G may joint together to form a ring. In formula (II), R3 and R4 are independently hydrogen or a substituent, R5 is an electron-withdrawing group, and two of R3, R4 and R5 may joint together to form a ring. The conjugate acid of the base has a pKa in the range of 1 to 15.

專利摘要(中)

A method for producing a homocyclic or heterocyclic compound includes reacting a compound of formula (I) with a compound of formula (II) in presence of a base: R1-B-G (I) . In formula (I), B is an unsaturated moiety selected from substituted or unsubstituted vinylene, ethynylene, aryleneethynylene, substituted or unsubstituted arylenevinylene, and a combination thereof, the vinylene or arylenevinylene has n (=0, 1 or 2) substituent(s) R2, G is an electron-withdrawing group, R1 is hydrogen or a substituent, and two of R1, R2 and G may joint together to form a ring. In formula (II), R3 and R4 are independently hydrogen or a substituent, R5 is an electron-withdrawing group, and two of R3, R4 and R5 may joint together to form a ring. The conjugate acid of the base has a pKa in the range of 1 to 15.

聯絡資訊
承辦人姓名	周家鳳
承辦人電話	03-5715131 #34576
承辦人Email	cf.chou@mx.nthu.edu.tw